ALD-02原子层沉积系统 ALD
价 格：询价
产 地：美国更新时间：2021/9/10 14:45:14
品 牌：SVT Associates型 号：ALD-02
状 态：正常点击量：5611
联 系 人：潘先生
电 话：010-62983188
传 真：010-62983188
等 级： (第 16年)
性 质：生产型,
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The Advanced ALD system is a viscous flow-type reactor for ultra thin film deposition. The growth process is controlled by a Windows-based software package. The base model is equipped with two gas
产品参数
— Operation Vacuum: 1 Torr to UHV
— 2 Heated Gas Lines (can be expanded to 12)
— Gas injection mode: bubbler and direct draw
— Sample size: up to 4 in standard, optional 12in
— Substrate heater: up to 500°C, optional higher temp
产品介绍
Applications
— High k dielectrics
— Nanocoatings
— Surface modification layers
— Device encapsulations
— Photonic crystals
Optional add-on components
— Remote plasma source
— Ozone delivery system
— Quartz crystal monitor
— Quadruple mass spectrometer
— Real-time temperature monitor
— Ellipsometer
— LoadLock
